N.Konishi, Y.Kawai, J.Watanabe and T.Ohmi: "Application of Dual-Frequency-Excitation Plasma Processing Equipment to High-Integrity ULSI Fabrication Processes" Proceeding, International Conference on AMDP (Advanced Microelectronics Devices and Processing),
N.Konishi, Y.Kawai, J.Watanabe and T.Ohmi: "Application of Dual-Frequency-Excitation Plasma Processing Equipment to High-Integrity ULSI Fabrication Processes" Proceeding, International Conference on AMDP (Advanced Microelectronics Devices and Processing),
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N.Konishi、Y.Kawai、J.Watanabe 和 T.Ohmi：“双频激励等离子体处理设备在高完整性 ULSI 制造工艺中的应用”论文集，AMDP（先进微电子器件和处理）国际会议，
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