Molecular Grafting to Silicon Surfaces in Air Using Organic Triazenes as Stable Diazonium Sources and HF as a Constant Hydride-Passivation Source
Molecular Grafting to Silicon Surfaces in Air Using Organic Triazenes as Stable Diazonium Sources and HF as a Constant Hydride-Passivation Source
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DOI:
10.1021/cm051104h
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发表时间:
2005-08
影响因子:
8.6
通讯作者:
Bo Chen;Austen K. Flatt;Huahua Jian;Jared L. Hudson;J. Tour
中科院分区:
文献类型:
--
作者:
Bo Chen;Austen K. Flatt;Huahua Jian;Jared L. Hudson;J. Tour
Aryl molecules were covalently grafted to hydride-passivated Si(100) surfaces (Si−H) by the in situ conversion of aryldiethyltriazenes into aryldiazonium salts using 2% HF, followed by spontaneous surface grafting of the aryl species to the silicon surface. Major advances are as follows: first, reactive diazonium species need not be isolated, and second, by using aqueous HF as the triazene-to-diazonium conversion promoter, the entire process can be carried out in air since any Si-oxide is continuously converted to the Si−H species. Molecular layers from a monolayer to 200 nm thick could be formed depending on the reaction conditions used. In one case where the molecule bore an α-triazene and ω-aniline (6), after grafting of the molecular layer onto Si−H via the triazene, the remaining aniline moiety was converted into a diazonium salt in situ with NOBF4 and then permitted to react with functionalized single-walled carbon nanotubes (SWNTs), thereby covalently attaching nanotubes to the silicon surface usi...