Characterization of mechanical properties of the carbon mechanical nanostructure fabricated from SU-8 resist by FIB/EB dual-beam lithography

Characterization of mechanical properties of the carbon mechanical nanostructure fabricated from SU-8 resist by FIB/EB dual-beam lithography
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FIB/EB 双束光刻法表征 SU-8 抗蚀剂制备的碳机械纳米结构的机械性能

DOI:
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发表时间:
2015
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影响因子:
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通讯作者:
E. Maeda
E. Maeda
中科院分区:
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文献类型:
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作者:
R. Kometnai;Y. Miyata;E. Maeda

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