Production of Fullerenes by Low Temperature Plasma Chemical Vaper Deposition under Atmospheric Pressure
Production of Fullerenes by Low Temperature Plasma Chemical Vaper Deposition under Atmospheric Pressure
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大气压下低温等离子体化学气相沉积法制备富勒烯
DOI：
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发表时间：
1994
期刊：
影响因子：
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通讯作者：
Hideomi Koinuma Hideomi Koinuma
中科院分区：
文献类型：
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作者：
Kiyoto Inomata;N. Aoki;Hideomi Koinuma Hideomi Koinuma
一种用于在大气压下产生均匀低温等离子体的气相反应器被发现提供了一种通过等离子体化学气相沉积（CVD）工艺制备富勒烯的新方法。在大气压氩氦混合气体等离子体的余辉区，引入芳香烃，在适当的反应条件下，芳香烃被分解成黑色烟灰。烟灰的苯溶液显示出两个清晰的HPLC峰，保留时间与C60和C70的保留时间完全对应。通过UV光谱进一步证实了C60的形成。
A gas phase reactor developed for generating homogenous low temperature plasma under atmospheric pressure was found to provide a new method for producing fullerenes by a plasma chemical vapor deposition (CVD) process. Into an afterglow region of atmospheric pressure Ar–He mixed gas plasma, an aromatic hydrocarbon was introduced and decomposed into black soot under appropriate reaction conditions. A benzene solution of the soot showed two clear HPLC peaks with retention times corresponding well to those of C60 and C70. The formation of C60 was further confirmed by UV spectroscopy.