The physical and chemical properties of ultrathin oxide films.
The physical and chemical properties of ultrathin oxide films.
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DOI：
10.1146/annurev.physchem.48.1.43
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发表时间：
1997
影响因子：
14.7
通讯作者：
Shane C. Street;C. Xu;D. Goodman
中科院分区：
文献类型：
--
作者：
Shane C. Street;C. Xu;D. Goodman
通过在氧背景（约1 × 10（-5）Torr）中沉积氧化物金属前体，制备了负载在难熔金属基底上的SiO2、MgO、NiO、Al 2 O3、FexOy和TiO 2的薄氧化物膜（从一个到几十个单层）。这些氧化物样品的薄度便于通过一系列表面技术进行调查，其中许多技术在应用于相应的块状氧化物时被排除在外。层状和混合二元氧化物的制备是通过顺序合成不同的氧化物层或共沉积两种不同的氧化物。最近的工作表明，底层氧化物衬底可以显着影响的电子和化学性质的覆盖层氧化物。利用俄歇电子能谱（AES）、X射线光电子能谱（XPS）、电子能量损失谱（ELS）、离子散射谱（ISS）、高分辨电子能量损失谱（HREELS）、红外反射吸收谱（IRAS）、程序升温脱附（TPD）、扫描隧道显微镜（STM）和扫描隧道光谱（STS）。
Thin oxide films (from one to tens of monolayers) of SiO2, MgO, NiO, Al2O3, FexOy, and TiO2 supported on refractory metal substrates have been prepared by depositing the oxide metal precursor in a background of oxygen (ca 1 x 10(-5) Torr). The thinness of these oxide samples facilitates investigation by an array of surface techniques, many of which are precluded when applied to the corresponding bulk oxide. Layered and mixed binary oxides have been prepared by sequential synthesis of dissimilar oxide layers or co-deposition of two different oxides. Recent work has shown that the underlying oxide substrate can markedly influence the electronic and chemical properties of the overlayer oxide. The structural, electronic, and chemical properties of these ultrathin oxide films have been probed using Auger electron spectroscopy (AES), X-ray photoelectron spectroscopy (XPS), electron energy loss spectroscopy (ELS), ion-scattering spectroscopy (ISS), high-resolution electron energy loss spectroscopy (HREELS), infrared reflectance absorption spectroscopy (IRAS), temperature-programmed desorption (TPD), scanning tunneling microscopy (STM), and scanning tunneling spectroscopy (STS).