Large-area well-ordered nanodot array pattern fabricated with self-assembled nanosphere template
Large-area well-ordered nanodot array pattern fabricated with self-assembled nanosphere template
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DOI：
10.1109/jsen.2008.923266
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发表时间：
2008-05-01
影响因子：
4.3
通讯作者：
Wu, Nianqiang
中科院分区：
文献类型：
--
作者：
Li, Huaqing;Low, Jeremy;Wu, Nianqiang
本文展示了一种简单的方法来制造大面积（类似于1 cm（2））有序的金纳米点阵列图案，具有高通量，低成本。首先，自组装聚苯乙烯（PS）球在水面上紧密堆积，然后通过浸涂从水面转移到固体基底。这导致在固体基底上的大面积无缺陷的紧密堆积的PS球单层模板。值得注意的是，大面积密排PS球模板可以转移到各种固体表面，包括硅，氧化物和金属，提供了很大的灵活性。此外，通过反应离子刻蚀（RIE）技术，可以将密排的PS单分子层裁剪成松散排列的球阵列模板。球体尺寸在蚀刻时减小，但球体之间的间距保持不变。通过利用PS球模板，金纳米点阵列的特征尺寸下降到30 nm已被制作。
This paper has demonstrated a simple method to fabricate a large-area (similar to 1 cm(2)) well-ordered gold nanodot array pattern with high throughput at low cost. At first, self-assembled polystyrene (PS) spheres are closely packed on a water surface, and then transferred from the water surface to a solid substrate by dip coating. This results in a large-area defect-free close-packed PS sphere monolayer template on the solid substrate. It is worthy noting that the large-area close-packed PS sphere template can be transferred to the surfaces of various solids including silicon, oxides and metals, offering great flexibility. Furthermore, the close-packed PS monolayer can be tailored to a loose-packed sphere array template by reactive ion etching (RIE) technique. The sphere size is reduced upon etching but the spacing between spheres retains unchanged. By utilizing the PS sphere template, gold nanodot arrays with feature size down to 30 nm have been fabricated.