Cyclic Block Copolymers for Controlling Feature Sizes in Block Copolymer Lithography
Cyclic Block Copolymers for Controlling Feature Sizes in Block Copolymer Lithography
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DOI：
10.1021/nn304217y
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发表时间：
2012-12-01
期刊：
影响因子：
17.1
通讯作者：
Hawker, Craig J.
中科院分区：
文献类型：
--
作者：
Poelma, Justin E.;Ono, Kosuke;Hawker, Craig J.
嵌段共聚光刻有望成为下一代技术，实现半导体路线图所要求的20纳米以下的特征尺寸。虽然分子量和嵌段不相容传统上被用来控制特征尺寸，但这项研究表明，大分子结构也是调节结构域间距的强大工具。为了论证这一概念，发展了一种基于双官能团线型链高效“点击”偶联的环状嵌段聚合物的合成策略，并将环状聚苯乙烯-嵌段-聚氧乙烯(CPS-b-PEO)的薄膜自组装与相应的线型类似物进行了比较。与相应的线性聚合物相比，环状体系的流体动力学半径的减小导致结构域间距减少了30%。
Block copolymer lithography holds promise as a next-generation technique to achieve the sub-20 nm feature sizes demanded by semiconductor roadmaps. While molecular weight and block immiscibility have traditionally been used to control feature size, this study demonstrates that macromolecular architecture is also a powerful tool for tuning domain spacing. To demonstrate this concept, a new synthetic strategy for cyclic block polymers based on highly efficient "click" coupling of difunctional linear chains is developed, and the thin film self-assembly of cyclic polystyrene-block-polyethylene oxide (cPS-b-PEO) is compared with the corresponding linear analogues. The reduced hydrodynamic radii of the cyclic systems result in similar to 30% decrease in domain spacing over the corresponding linear polymers.