A strategy of finely optimizing WOX electrochromic layers for application in flexible ATF-ECDs
A strategy of finely optimizing WOX electrochromic layers for application in flexible ATF-ECDs
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DOI:
10.1016/j.electacta.2021.139669
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发表时间:
2021-12
影响因子:
6.6
通讯作者:
Rui Wang;Han Lin;Hongbing Zhu;M. Wan;K. Shen;Y. Mai
中科院分区:
文献类型:
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作者:
Rui Wang;Han Lin;Hongbing Zhu;M. Wan;K. Shen;Y. Mai
In this study, tungsten oxide (WOX) thin films were prepared by reactive magnetron sputtering at different oxygen (O2) fluxes for application in flexible all-thin-film electrochromic devices (ATF-ECDs) with a device configuration of PET/ITO/NiOX/Ta2O5/WOX/ITO. The target voltage vs. O2flux curve presents two sputtering mode zones, where distinct target voltages reflect the specific target surface states. The WOXthin film deposited at the O2flux of 4.5 sccm, which sites at the onset point reaching to the maximal target voltage, exhibits amorphous structure, relatively loose morphology, proper chemical compositions, high light transmittance and best electrochemical properties. The corresponding flexible ATF-ECD performs excellent electrochromic performances with high light modulation of up to 70%, fast response time and the highest coloration efficiencies at both bleaching and coloring steps.