Induced orientational order in symmetric diblock copolymer thin films
Induced orientational order in symmetric diblock copolymer thin films
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DOI：
10.1002/adma.200600287
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发表时间：
2007-02-19
影响因子：
29.4
通讯作者：
Black, Charles T.
中科院分区：
文献类型：
--
作者：
Ruiz, Ricardo;Sandstrom, Robert L.;Black, Charles T.
提出了一种新的聚合物多层膜制备方法，即采用层状聚苯乙烯-嵌段聚甲基丙烯酸甲酯（PS-bPMMA）薄膜。该技术的有效性证明了图案化纳米级硅线阵列。展示了一种多层图案化工艺，其特征在于无缺陷的层状图案形成（见图）。
A new polymer multilayer fabrication method that employs employing thin films of lamellar polystyrene-block poly(methyl methacrylate) (PS-bPMMA) is presented. The effectiveness of the technique is demonstrated by patterning nanometer-scale silicon wire arrays. A multilayer patterning process that features defect-free lamellar pattern formation is demonstrated (see figure).