Quantum yield for hydrogen atom formation from H2O2 photolysis in the range 193-240 nm
Quantum yield for hydrogen atom formation from H2O2 photolysis in the range 193-240 nm
复制标题
DOI：
10.1002/kin.20127
复制
发表时间：
2005-12-01
影响因子：
1.5
通讯作者：
Matsumi, Y
中科院分区：
文献类型：
--
作者：
Nakayama, T;Takahashi, K;Matsumi, Y
用脉冲激光光解和121.56nm处的H原子碎片的激光诱导荧光检测研究了H_2O_2在193-240 nm范围内的光解过程。在295 2 K下，H原子形成的量子产额分别为0.20 ± 0.03，0.038 ± 0.008，0.029 ± 0.003，0.015 ± 0.006，0.007 ± 0.002.在240 nm处，仅获得< 0.002的上限值。(c)2005 Wiley Periodicals，Inc.
Photodissociation processes of H2O2 in the range 193-240 nm have been studied by pulsed laser photolysis and laser-induced fluorescence detection of H atom fragments at 121.56 nm. The quantum yield values for H atom formation at 295 2 K have been determined to be 0.20 0.03, 0.038 +/- 0.008, 0.029 +/- 0.003, 0.015 +/- 0.006, 0.007 +/- 0.002 at 193, 207, 210, 220, and 230 nm, respectively. At 240 nm, only the upper limit value of < 0.002 has been obtained. (c) 2005 Wiley Periodicals, Inc.