Organosilane self-assembled monolayers directly linked to the diamond surfaces
Organosilane self-assembled monolayers directly linked to the diamond surfaces
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DOI：
10.1116/1.1776184
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发表时间：
2004-09-01
影响因子：
2.9
通讯作者：
Takai, O
中科院分区：
文献类型：
--
作者：
Ohta, R;Saito, N;Takai, O
以对氨基苯基三甲氧基硅烷(H2N(CH)(6)Si(OCH3)(3), APhS)为原料，采用真空紫外(VUV)光(波长：172 nm)化学气相沉积法在金刚石基底上制备了端氨基自组装单分子层(SAM)。此外，APhS-SAM 在空气中受到 VUV 光照射。 VUV 照射后，由于有机化合物的选择性分解，仅留下一层硅氧烷（SiOx）。在 SiOx 表面重新制备了 APhS-SAM。通过 X 射线光电子能谱 (XPS) 和水接触角测量清楚地获得了有关各个过程的证据。基于化学键态分析，证实 APhS-SAM 直接连接到金刚石基底和 SiOx 层，键合类型分别为 Si-O-C 和 Si-O-Si。由XPS测量获得的组成表明，通过按顺序重复APhS-SAM形成和VUV照射，SiOx层的厚度逐渐增加。最后，我们成功地控制了 SiOx 层的纳米级厚度，该层是 APhS-SAM 和金刚石基底之间的界面。 (C) 2004 年美国真空协会。
An amino-terminated self-assembled monolayer (SAM) was prepared from p-aminophenyltrimethoxysilane (H2N(CH)(6)Si(OCH3)(3), APhS) on diamond substrates irradiated by vacuum ultraviolet (VUV) light (wavelength: 172 nm) through chemical vapor deposition. Furthermore, the APhS-SAM was irradiated by VUV light in air. After the VUV irradiation, only one layer of siloxane (SiOx) was left as a result of the selective decomposition of organic compounds. APhS-SAM was reprepared on the SiOx surface. The evidence as to the respective processes was clearly obtained by x-ray photoelectron spectroscopy (XPS) and water contact angle measurements. Based on the chemical bonding states analysis, APhS-SAMs were confirmed to be directly linked to the diamond substrates and SiOx layers with bonding types of Si-O-C and Si-O-Si, respectively. The compositions obtained by XPS measurement indicate that the thickness of the SiOx layer was increased gradually by repeating the APhS-SAM formations and VUV irradiations in this order. Finally, we are successful in controlling the nano-scale thickness of the SiOx layer, which is the interface between APhS-SAMs and diamond substrates. (C) 2004 American Vacuum Society.