Wafer-Scale Growth of Single-Crystal 2D Semiconductor on Perovskite Oxides for High-Performance Transistors
Wafer-Scale Growth of Single-Crystal 2D Semiconductor on Perovskite Oxides for High-Performance Transistors
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用于高性能晶体管的钙钛矿氧化物上单晶二维半导体的晶圆级生长
DOI:
10.1021/acs.nanolett.9b00381
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发表时间:
2019
期刊:
影响因子:
--
通讯作者:
Peng Hailin
中科院分区:
文献类型:
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作者:
Tan Congwei;Tang Min;Wu Jinxiong;Liu Yinan;Li Tianran;Liang Yan;Deng Bing;Tan Zhenjun;Tu Teng;Zhang Yichi;Liu Cong;Chen Jian-Hao;Wang Yong;Peng Hailin
Emerging two-dimensional (2D) semiconducting materials serve as promising alternatives for next-generation digital electronics and optoelectronics. However, large-scale 2D semiconductor films synthesized so far are typically polycrystalline with defective grain boundaries that could degrade their performance. Here, for the first time, wafer-size growth of a single-crystal Bi2O2Se film, which is a novel air-stable 2D semiconductor with high mobility, was achieved on insulating perovskite oxide substrates [SrTiO3, LaAlO3, (La, Sr)(Al, Ta)O3]. The layered Bi2O2Se epilayer exhibits perfect lattice matching and strong interaction with perovskite oxide substrates, which enable unidirectional alignment and seamless mergence of multiple seeds into single-crystal continuous films free of detrimental grain boundaries. The single-crystal Bi2O2Se thin films show excellent spatial homogeneity over the entire wafer and allow for the batch fabrication of high-performance field-effect devices with high mobilities of ∼150 cm2V–1s–1at room temperature, excellent switching behavior with large on/off ratio of >105, and high drive current of ∼45 μA μm–1at a channel length of ∼5 μm. Our work makes a step toward the practical applications of high-mobility semiconducting 2D layered materials and provides an alternative platform of oxide heterostructure to investigate novel physical phenomena.