A study on growth processes of CoNiP perpendicular magnetic anisotropy films electroless-deposited at room temperature
A study on growth processes of CoNiP perpendicular magnetic anisotropy films electroless-deposited at room temperature
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DOI：
10.1016/s0013-4686(97)00151-5
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发表时间：
1997
影响因子：
6.6
通讯作者：
T. Homma;Yuji Sezai;T. Osaka
中科院分区：
文献类型：
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作者：
T. Homma;Yuji Sezai;T. Osaka
为了阐明具有垂直磁各向异性的化学沉积CoNiP薄膜的磁性能和微观结构的来源，主要研究了镀液因素对其初始生长过程的影响。结果表明，随着镀液中氨气浓度的增加，薄膜的矫顽力和晶粒度变化较大，而薄膜的平均成分和晶体取向不变。对生长过程的详细分析表明，镀液中氨浓度的增加抑制了每个微晶的生长，导致了较小的晶粒尺寸和矫直力，但对经催化处理的衬底表面的沉积活性和平均薄膜成分几乎没有影响。
In order to elucidate the origin of magnetic properties and microstructure of electroless-deposited CoNiP films with perpendicular magnetic anisotropy, their initial growth processes were investigated mainly focusing upon the effects of bath factors. It was clarified that coercivity and grain size of the films changed widely with an increase in the ammonia concentration in the bath without varying the average film composition and crystal orientation. Detailed analysis of the growth processes clarified that an increase in ammonia concentration in the bath inhibited the growth of each crystallite, resulting in small grain size and coercivity, whereas it hardly affected the deposition activity of the catalytically-treated substrate surface and average film composition.