The adhesion of evaporated metal films on glass
The adhesion of evaporated metal films on glass
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蒸镀金属膜在玻璃上的附着力
DOI：
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发表时间：
1961
期刊：
影响因子：
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通讯作者：
C. Weaver
中科院分区：
文献类型：
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作者：
P. Benjamin;C. Weaver
本文研究了用真空技术沉积在玻璃表面上的大量金属薄膜的附着力。已经发现，金属对氧的亲和力在确定粘附性中起重要作用，并且结果似乎证实了在金属/玻璃界面处形成中间氧化物层对于良好粘附性是必要的理论。关于该中间氧化物层是如何形成的一直存在一些疑问，并且本研究已经表明，沉积期间残余气氛的性质和压力决定了沉积期间氧化物层形成的程度，因此决定了膜的初始粘附性。然而，已经观察到许多金属的膜的粘附性随时间的变化，并且似乎如果在沉积期间氧化物层的形成不完全，则气体向金属/玻璃界面的扩散可以在沉积之后继续氧化物层的形成，从而解释粘附性随时间的变化。由于膜结构将决定气体向界面扩散的速率和程度，因此它可能是影响粘附力的重要因素。电子显微镜检查的一些电影已经取得了，并确认的重要性，薄膜结构。此外，某些异常现象，例如低熔点金属和铝的膜的粘附性差，可以基于膜结构来解释。
The adhesion of films of a large number of metals deposited by vacuum techniques on to a glass surface have been examined. It has been found that the affinity of the metal for oxygen plays an important role in determining the adhesion and the results appear to confirm the theory that the formation of an intermediate oxide layer at the metal/glass interface is necessary for good adhesion. There has been some doubt as to how this intermediate oxide layer is formed and the present investigation has shown that the nature and pressure of the residual atmosphere during deposition determines the extent of the formation of the oxide layer during deposition and therefore the initial adhesion of the films. However, variations in adhesion with time have been observed with films of a number of metals and it would appear that if the formation of the oxide layer is not complete during deposition then diffusion of gas to the metal/glass interface can continue the formation of the oxide layer after deposition thus accounting for the variation in adhesion with time. Since the film structure would determine the rate and extent of the diffusion of gas to the interface, it can be an important factor affecting the adhesion. Electron-microscope examination of a number of the films has been made and confirms the importance of the film structure. Furthermore, certain anomalies such as the poor adhesion of films of the low melting point metals and aluminium can be explained on the basis of film structure.