In situ GaN decomposition analysis by quadrupole mass spectrometry and reflection high-energy electron diffraction
In situ GaN decomposition analysis by quadrupole mass spectrometry and reflection high-energy electron diffraction
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DOI:
10.1063/1.2968442
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发表时间:
2008-08-01
影响因子:
3.2
通讯作者:
Speck, J. S.
中科院分区:
文献类型:
--
作者:
Fernandez-Garrido, S.;Koblmueller, G.;Speck, J. S.
Thermal decomposition of wurtzite (0001)-oriented GaN was analyzed: in vacuum, under active N exposure, and during growth by rf plasma-assisted molecular beam epitaxy. The GaN decomposition rate was determined by measurements of the Ga desorption using in situ quadrupole mass spectrometry, which showed Arrhenius behavior with an apparent activation energy of 3.1 eV. Clear signatures of intensity oscillations during reflection high-energy electron diffraction measurements facilitated complementary evaluation of the decomposition rate and highlighted a layer-by-layer decomposition mode in vacuum. Exposure to active nitrogen, either under vacuum or during growth under N-rich growth conditions, strongly reduced the GaN losses due to GaN decomposition. (C) 2008 American Institute of Physics.