High performance graphene oxide nanofiltration membrane prepared by electrospraying for wastewater purification
High performance graphene oxide nanofiltration membrane prepared by electrospraying for wastewater purification
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DOI：
10.1016/j.carbon.2018.01.062
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发表时间：
2018-04-01
期刊：
影响因子：
10.9
通讯作者：
Ci, Lijie
中科院分区：
文献类型：
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作者：
Chen, Long;Moon, Jung-Hyeon;Ci, Lijie
采用电喷雾技术制备了一种高性能氧化石墨烯纳滤膜（GO NFM），以取代传统的真空过滤法制备直径为100 mm的GO NFM。即使在极低的外部压力（1.0巴）下，这也给出了纯水的高通量值（11.13-20.23 Lm（-2）h（-1）bar（-1））。GO（120）NFM表现出高的有机染料截留率（对BF、MB、MO和EB分别为98.88%、98.97%、100%和99.99%）。对荷电染料的截留机理进行了探讨，结果表明，物理尺寸筛分和静电相互作用是该体系的主要截留机理。基于Donnan排斥理论和空间位阻效应，GO NFM对Na_2SO_4、NaCl、MgSO_4和MgCl_2的排斥率分别为63.13%、27.86%、41.82%和15.00%。此外，GO NFM显示出高通量恢复率（FRR）值（SA和HA为89.58%和95.54%），表明GO NFM由于光滑和亲水的表面而更容易通过去离子水洗涤来回收。(c)2018由Elsevier Ltd.出版
A high performance graphene oxide nanofiltration membrane (GO NFM) was prepared using the electrospraying technique instead of the traditional vacuum filtration method, which is a facial and scalable method to prepare GO NFMs with diameter of 100 mm. The permeate performance of this novel nanofiltration membrane was evaluated using a dead end filtration device, which gave us a high flux value for pure water (11.13-20.23 Lm(-2) h(-1) bar(-1)) even under an extremely low external pressure (1.0 bar). The GO(120) NFM demonstrated high organic dyes rejection rate (98.88%, 98.97%, 100%, and 99.99%, for BF, MB, MO, and EB, respectively). The rejection mechanism for charged dyes was discussed and the results revealed that physical size sieving and electrostatic interaction dominated the rejection mechanism. The rejections rate of GO NFMs for the Na2SO4, NaCl, MgSO4, and MgCl2 were 63.13%, 27.86%, 41.82%, and 15.00%, respectively, based on the mechanism of Donnan exclusion theory and steric hindrance effect. Furthermore, the GO NFM shows high flux recovery ratio (FRR) values (89.58% and 95.54% for SA and HA), suggesting that the GO NFM is easier to be recovered by DI water washing due to the smooth and hydrophilic surface. (c) 2018 Published by Elsevier Ltd.