High resolution hologram interferometry by electronic phase measurement
High resolution hologram interferometry by electronic phase measurement
复制标题
通过电子相位测量进行高分辨率全息干涉测量
DOI：
10.1016/0030-4018(73)90284-8
复制
发表时间：
1973
影响因子：
2.4
通讯作者：
F. Mottier
中科院分区：
文献类型：
--
作者：
R. Dändliker;B. Ineichen;F. Mottier
所描述的双频方法内插任何一种全息干涉法的条纹图案小于1 100条条纹，独立于强度变化。双曝光全息实验表明，在物体的任何一点分辨率为6× 10−4。变形的空间导数可以精确测量，用于机械应变分析。
The described dual frequency method interpolates the fringe pattern of any kind of hologram interfermetry down to better than 1 100 of a fringe, independent of intensity variations. Experiments with double-exposure holography demonstrate a resolution of 6× 10− 4 fringes at any point of the object. Spatial derivatives of deformations can be measured accurately for mechanical strain analysis.