Charged Particle Flux Generated by an Electron-Beam Deposition Source
Charged Particle Flux Generated by an Electron-Beam Deposition Source
复制标题
电子束沉积源产生的带电粒子通量
DOI：
10.1116/1.1315820
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发表时间：
1970
期刊：
影响因子：
--
通讯作者：
E. B. Graper
中科院分区：
文献类型：
--
作者：
E. B. Graper
带电粒子流由电子束蒸发源产生。这些带电粒子在薄膜表面相互作用，影响薄膜的特性，并可能导致测量仪器（如薄膜电阻监测器）出现虚假读数。用1cm ~ 2探针测量了180 °弯束枪的通量和平均粒子能量。这些测量是在距离源40 cm处进行的，并且源功率为6 kW，使用铝、铜和银。发现由低能粒子组成的净通量具有与沉积银和铜的金属通量相同数量级的电子密度。铝的正离子通量约为其他金属的0.1%。讨论了沉积速率和源功率对通量和平均粒子能量的影响。
A charged particle flux is generated by electron-beam evaporation sources. These charged particles interact on the surface of thin films, affecting their properties, and can cause spurious readings on measuring instruments such as thin-film resistance monitors. The flux and average particle energy from a 180 ° bent beam gun has been measured using a 1 cm2 probe. These measurements were made at 40 cm from the source and at source power to 6 kW with aluminum, copper, and silver. The net flux, consisting of low energy particles, was found to have an electron density on the same order as that of the metal flux being deposited for silver and copper. A positive ion flux of about 0.1% of that for the other metals was observed for aluminum. The influence of deposition rate and source power on flux arid average particle energy are discussed.