Single pulse short-circuit robustness and repetitive stress aging of GaN GITs
Single pulse short-circuit robustness and repetitive stress aging of GaN GITs
复制标题
GaN GIT 的单脉冲短路鲁棒性和重复应力老化
DOI:
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发表时间:
2018
期刊:
影响因子:
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通讯作者:
M. Pfost
中科院分区:
文献类型:
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作者:
A. Castellazzi;A. Fayyaz;Siwei Zhu;T. Oeder;M. Pfost
Short-circuit withstand capability is a key requirement for semiconductor power devices in a number of strategic application domains, including traction, renewable energies and power distribution. Indeed, though clearly a non-intentional operational mode, sort-circuit can be nonetheless a relatively frequent event. Due to its associated considerable electro-thermal stress levels, a thorough analysis of both single pulse withstand capability and device aging as a result of repetitive stress are mandatory before widespread deployment of new device technologies. In this paper, the focus is on latest generation commercial gate-injection GaN transistors, in the 600 V rating class. Extensive experimental analysis is presented, putting forward an interpretation of the underlying degradation and failure mechanisms, supported by coupled electro-thermal device models, incorporating both the functional and structural characteristics of the devices. The findings highlight a remarkable robustness of a specific type of p-gate GaN HEMTs, referred to as gate injection transistors (GITs), against short-circuit stress, making them a potentially very attractive and competitive technology in the voltage class of relevance.