Designing a 40.68 MHz power-combining resonant inverter with eGaN FETs for plasma generation
Designing a 40.68 MHz power-combining resonant inverter with eGaN FETs for plasma generation
复制标题
设计用于等离子体生成的具有 eGaN FET 的 40.68 MHz 功率组合谐振逆变器
DOI:
10.1109/ecce.2018.8557680
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发表时间:
2018
期刊:
影响因子:
--
通讯作者:
J. Rivas
中科院分区:
文献类型:
--
作者:
Jungwon Choi;Yasuyuki Ooue;Naoki Furukawa;J. Rivas
This paper presents the design of a 40.68 MHz, 1.2 kW power-combining resonant inverter using eGaN FETs for plasma generation. Operating at very high frequency (VHF) allows the use of smaller passive components and has the potential to improve the power density of an RF power amplifier for plasma applications. To provide high power at 40.68 MHz switching frequency, a class $\Phi_{2}$ inverter topology with wide band gap (WBG) devices such as eGaN FETs was selected. Using WBG devices in resonant inverters helps us increase switching frequencies while providing relatively higher efficiency compared to silicon devices. In contrast to using RF MOSFETS with large on-resistance and input capacitance, using eGaN FETs with lower on-resistance and input capacitance results in relatively higher efficiency of resonant inverters. However, these FETs in high-power operation cannot effectively dissipate heat at VHF. To reduce the losses in each eGaN FET, we designed and implemented the power-combining inverter based on a class $\Phi_{2}$ inverter to provide 1.2 kW output power at 40.68 MHz. The tuning method of a single class $\Phi_{2}$ inverter enables us to easily connect four inverters in parallel, creating a power-combining inverter that increases the output power. Also, the proposed inverter topology reduces the power loss in each switching device, which can decrease the size of the heat sink. This study demonstrates that power-combining resonant inverters using eGaN FETs can increase efficiency and power density while operating at 40.68 MHz.