Comprehensive characterization of metal-semiconductor-metal ultraviolet photodetectors fabricated on single-crystal GaN
Comprehensive characterization of metal-semiconductor-metal ultraviolet photodetectors fabricated on single-crystal GaN
复制标题
DOI:
10.1063/1.367484
复制
发表时间:
1998-06-01
影响因子:
3.2
通讯作者:
Campbell, JC
中科院分区:
文献类型:
--
作者:
Carrano, JC;Li, T;Campbell, JC
We report on the material, electrical, and optical properties of metal-semiconductor-metal ultraviolet photodetectors fabricated on single-crystal GaN, with active layers of 1.5 and 4.0 mu m thickness. We have modeled current transport in the 1.5 mu m devices using thermionic field emission theory, and in the 4.0 mu m devices using thermionic emission theory. We have obtained a good fit to the experimental data. Upon repeated field stressing of the 1.5 mu um devices, there is a degradation in the current-voltage (I-V) characteristics that is trap related. We hypothesize that traps in the GaN are related to a combination of surface defects (possibly threading dislocations), and deep-level bulk states that are within a tunneling distance of the interface. A simple qualitative model is presented based on experimental results. For devices fabricated on wafers with very low background free electron concentrations, there is a characteristic "punch-through" voltage. which we attribute to the interaction of the depletion region with the underlying low-temperature buffer layer. We also report GaN metal-semiconductor-metal photodetectors with high quantum efficiencies (similar to 50%) in the absence of internal gain. These photodetectors have a flat responsivity above the band gap (measured at similar to 0.15 A/W) with a sharp, visible-blind cutoff at the band edge. There is no discernible responsivity for photons below the band-gap energy. We also obtained record low dark current of similar to 800 fA at -10 V reverse bias. The dark current and ultraviolet photoresponse I-V curves are very flat out to V-R>-25 V, and do not show evidence of trap-related degradation, or punch-through effects. (C) 1998 American Institute of Physics. [S0021-8979(98)05611-4]