Physics of Thin Films
Physics of Thin Films
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DOI：
10.1149/1.2426128
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发表时间：
1964-03
影响因子：
3.9
通讯作者：
G. Hass;D. Gerstenberg
中科院分区：
文献类型：
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作者：
G. Hass;D. Gerstenberg
大约五年前，当一个人想要熟悉薄膜沉积技术和薄膜的性质时，有两本标准的书，涵盖了这些主题的文献。这些书是荷兰和梅尔写的。然而，在过去的几年里，每年发表的关于电影各个方面的论文数量急剧增加，一个作者几乎不可能跟上这个迅速发展的领域的所有新发展。由于这一领域的研究，包括光学、电学、磁学和超导性质以及各种表面反应和表面现象，仅举几例，很可能在未来以更快的速度增长，因此明确需要关于这一领域重要进展的最新调查文章。“薄膜物理学”系列的第一卷确实很好地满足了这一目的。HL Caswell的第一篇文章是关于超高真空蒸发器和残余气体分析的，强调了沉积薄膜的真空在确定其特性方面的重要性。第二篇文章是关于光学薄膜的理论和计算，RP Madden讨论了真空紫外线反射膜的制备和测量。这篇文章之所以显得与众不同，是因为它报告了位于弗吉尼亚州贝尔沃堡的工程师研究与开发实验室所做的原创工作，这是第一次在这里发表。图恩的第四篇文章讨论了薄膜的结构。它包括一节的方法和仪器的结构测定，如电子显微镜和电子衍射。结果表明，x射线衍射可以用于薄膜结构的测定。WB Ittner， III和EM Pugh的最后两篇文章是关于镍铁的低温薄膜和磁性薄膜的。伊特纳对超导理论的介绍对不熟悉最新发展的读者应该是有帮助的。每篇文章都有很好的文档，为对这些与薄膜相关的特定问题感兴趣的读者提供了充足的参考。编者在叙述沉积技术和真空设备时避免了过多的重叠，这一点值得赞扬。有一些小麻烦；例如，一些数字被介绍，但没有显示在同一页上，在两种情况下（第193和222页）数字的字母是向上的
About five years ago when one wanted to become acquainted with thin film deposition techniques and the properties of thin films there were two standard books which covered the literature published on these subjects quite adequately. These books were written by Holland and Mayer. However, in the past few years the number of papers published annually on all aspects of films has increased tremendously and it is next to impossible for one author to keep abreast of all the new developments in this rapidly expanding field. Since it is likely that the research in this area which includes optical, electrical, magnetic, and superconducting properties as well as various surface reactions and surface phenomena, just to name a few, will grow at an even faster rate in the future, there was a definite need for up-to-date survey articles on important advances in this field. The first volume of the series" Physics of Thin Films" serves this purpose very well, indeed. Quite appropriately the first article by HL Caswell is on ultrahigh vacuum evaporators and residual gas analysis with emphasis on the importance of the vacuum in which films are deposited in determining their characteristics. The second article byPH Berning is on the theory and calculations of optical thin films and RP Madden discusses the preparation and measurement of reflecting coatings for the vacuum ultra violet. This article appears to stand out because it reports on original work done at the Engineer Research and Development Laboratory at Ft. Belvoir, Va., which is published here for the first time. The fourth article by RE Thun deals with the structure of thin films. It includes a section on the methods and instruments for structure determination such as electron microscopy and electron diffraction. It is also shown that X-ray diffraction can be adapted for the structure determination of thin films. The last two articles by WB Ittner, III, and EM Pugh are on low temperature films and magnetic films of nickel-iron. The introduction to the theory of superconductivity by WB Ittner should prove helpful for the reader not familiar with the newer developments. Each article is well documented, providing ample references for the reader interested in these specific problems associated with thin films. The editor is to be commended for preventing too much overlap with respect to the description of deposition techniques and vacuum equipment. There are some minor annoyances; eg, some figures are introduced but not shown on the same page, in two cases (pp. 193 and 222) the lettering of figures is upside