A Study of the Mechanisms Involved during Dissolution of Silica in Liquid Silicon
A Study of the Mechanisms Involved during Dissolution of Silica in Liquid Silicon
复制标题
二氧化硅在液态硅中溶解过程的研究
DOI：
10.1149/1.2096553
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发表时间：
1989
影响因子：
3.9
通讯作者：
T. Carlberg
中科院分区：
文献类型：
--
作者：
U. Ekhult;T. Carlberg
通过应用众所周知的热力学、生长动力学、扩散过程和实验结果，对二氧化硅与液态硅接触的行为提出了合理的解释。二氧化硅分解为固体 SiO2，以及硅和氧离子通过固体 SiO2 的扩散，在讨论中发挥着重要作用。概述了硅晶体直拉法生长的后果
By the application of well-known thermodynamics, growth kinetics, diffusion processes, and experimental results, a reasonable explanation for the behavior of silica in contact with liquid silicon is presented. Decomposition of silica to solid SiO, and diffusion of silicon and oxygen ions through solid SiO, play important parts in the discussion. The consequences for Czochralski growth of silicon crystals are outlined