Ultrathin polyorganosilica membranes synthesized by oxygen-plasma treatment of polysiloxanes for H2/CO2 separation
Ultrathin polyorganosilica membranes synthesized by oxygen-plasma treatment of polysiloxanes for H2/CO2 separation
复制标题
用于 H2/CO2 分离的聚硅氧烷氧等离子体处理合成的超薄聚有机硅膜
DOI:
10.1016/j.memsci.2023.122099
复制
发表时间:
2023
影响因子:
9.5
通讯作者:
Zhang, Yugang
中科院分区:
文献类型:
--
作者:
Bui, Vinh;Satti, Varun R.;Haddad, Elizabeth;Hu, Leiqing;Deng, Erda;Zhu, Lingxiang;Lee, Won-Il;Yin, Yifan;Kisslinger, Kim;Zhang, Yugang
Oxygen plasma treatment of polydimethylsiloxane (PDMS) induces an ultrathin polyorganosilica (POSi) layer (<10 nm) on top of a PDMS membrane, leading to excellent H2/gas separation properties and providing a rapid and scalable way to fabricate robust silica membranes compared with conventional high-temperature and time-consuming sol-gel methods. Here, we thoroughly investigate POSi membranes derived from poly (dimethylsiloxane-co-methylhydroxidesiloxane) (poly (DMS-co-MHOS)) containing -SiOH groups that can be more easily converted to silica networks than the -SiCH3in PDMS. The effect of the polysiloxane structure and plasma treatment conditions (including plasma generating powers, oxygen flowrate, chamber pressure, and treatment time) on the silica chemistry, structure, and H2/CO2separation properties are systematically determined to derive structure/property relationships. An optimized membrane exhibits H2permeance of 880 GPU and H2/CO2selectivity of 67 at 150 °C, superior to state-of-the-art polymeric membranes. The membrane retains H2/CO2selectivity as high as 46 when challenged with simulated syngas containing 2.8 mol% water vapor at 150 °C, demonstrating the potential of these POSi membranes for practical applications.
登录
查看更多内容
影响因子:
15
作者:
Kanezashi, Masakoto;Yada, Kazuya;Tsuru, Toshinori
通讯作者:
Tsuru, Toshinori
DOI:
--
发表时间:
2023
期刊:
Advances in Materials
影响因子:
--
作者:
Leiqing Hu;Kaiwen Chen;Wonmoo Lee;K. Kisslinger;C. Rumsey;Shouhong Fan;Vinh Bui;Narjes Esmaeili;Thien N. Tran;Yifu Ding;Martin Trebbin;C. Nam;M. Swihart;Haiqing Lin
通讯作者:
Haiqing Lin
影响因子:
17.1
作者:
Shunnzo Aoyama;Hiroki Nagasawa;M. Kanezashi;T. Tsuru
通讯作者:
T. Tsuru
影响因子:
56.9
作者:
Li, Hang;Song, Zhuonan;Yu, Miao
通讯作者:
Yu, Miao
DOI:
10.1016/j.advmem.2023.100064
发表时间:
2023-01-01
期刊:
ADVANCED MEMBRANES
影响因子:
--
作者:
Bui,Vinh;Tandel,Ameya Manoj;Lin,Haiqing
通讯作者:
Lin,Haiqing