K.Hiraoka: "Segregation of As on GaAs(100)Surface during Abrasion Process Studied by X-ray Photoelectron Spectroscopy and Auger Election Spectroscopy" Jpn.J.Appl.Phys.32. 5080-5084 (1993)
K.Hiraoka: "Segregation of As on GaAs(100)Surface during Abrasion Process Studied by X-ray Photoelectron Spectroscopy and Auger Election Spectroscopy" Jpn.J.Appl.Phys.32. 5080-5084 (1993)
复制标题
K.Hiraoka：“通过 X 射线光电子能谱和俄歇电子能谱研究磨损过程中 GaAs(100) 表面上 As 的分离”Jpn.J.Appl.Phys.32。
DOI：
--
复制
发表时间：
--
期刊：
影响因子：
--
通讯作者：
中科院分区：
文献类型：
--
作者：
