Influence of primary electron incident angle and electron bombardment on the secondary electron yield of laser-treated copper
Influence of primary electron incident angle and electron bombardment on the secondary electron yield of laser-treated copper
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DOI：
10.1116/6.0000952
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发表时间：
2021-03
期刊：
影响因子：
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通讯作者：
Yigang Wang;Wenli Zhang;Sihui Wang;Wei Wei-Wei;Jian Fang;B. Zhu;Yong Wang
中科院分区：
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作者：
Yigang Wang;Wenli Zhang;Sihui Wang;Wei Wei-Wei;Jian Fang;B. Zhu;Yong Wang
电子云是现代加速器运行中一个长期存在的问题。可以通过降低二次电子产率（SEY）来消除它，这是真空室材料的特性。在本研究中，通过激光蚀刻技术在无氧铜样品表面刻槽，可以显著减轻无氧铜样品的SEYs。这种减缓是通过在凹槽中捕获入射的初级电子及其诱导的次级电子来实现的。激光蚀刻样品的入射光强取决于凹槽的几何特征和一次电子的入射角，即减小入射角可以导致入射光强的减小。以2 × 10−2 C mm−2的电子剂量轰击凹槽表面，将其最大SEY从1.15进一步降低到0.98，这可能是由于Cu2O和石墨样C - C键的形成以及表面污染物的去除。
Electron cloud is a persistent problem in operating modern accelerators. It might be eliminated by reducing the secondary electron yield (SEY), which is a property of the material of vacuum chambers. In the present study, the SEYs of oxygen-free copper samples are dramatically mitigated by grooving their surfaces with a laser-etching technique. Such mitigation is realized by trapping incident primary electrons and their induced secondary electrons in the grooves. The SEYs of the laser-etched samples are dependent on the geometrical characteristics of the grooves and the incident angles of the primary electrons, i.e., reducing the incident angle can lead to a reduction in the SEY. Electron bombardment of the grooved surface with an electron dose of 2 × 10−2 C mm−2 will further reduce its maximum SEY from 1.15 to 0.98, which might be attributed to the formation of Cu2O and graphite-like C—C bonds and the removal of surface contaminants.