Approaching ultrathin VO2 films on sapphire (001) substrates by biased reactive sputtering: Characteristic morphology and its effect on the infrared-light switching

Approaching ultrathin VO2 films on sapphire (001) substrates by biased reactive sputtering: Characteristic morphology and its effect on the infrared-light switching
复制标题

通过偏置反应溅射在蓝宝石 (001) 衬底上制备超薄 VO2 薄膜:特征形貌及其对红外光切换的影响

DOI:
10.1116/6.0001023
复制
发表时间:
2021
期刊:
Journal of Vacuum Science & Technology A
影响因子:
--
通讯作者:
Uehara Yoichi
Uehara Yoichi
中科院分区:
--
文献类型:
--
作者:
Okimura Kunio;Sakai Joe;Kuwahara Masashi;Zaghrioui Mustapha;Uehara Yoichi

文献摘要

相似文献