Sputtering yields and surface modification of poly(methyl methacrylate) (PMMA) by low-energy Ar+ / CF3+ ion bombardment with vacuum ultraviolet (VUV) photon irradiation

Sputtering yields and surface modification of poly(methyl methacrylate) (PMMA) by low-energy Ar+ / CF3+ ion bombardment with vacuum ultraviolet (VUV) photon irradiation
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真空紫外 (VUV) 光子照射低能 Ar/CF3 离子轰击聚甲基丙烯酸甲酯 (PMMA) 的溅射产率和表面改性

DOI:
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发表时间:
2012
期刊:
J. Phys. D: Appl. Phys
影响因子:
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通讯作者:
and S. Hamaguchi
and S. Hamaguchi
中科院分区:
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文献类型:
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作者:
S. Yoshimura;Y. Tsukazaki;M. Kiuchi;S.Sugimoto;and S. Hamaguchi

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