Electrochemical Characterization of Passive Films on Ni-Based Alloys in Acidic and Neutral Solutions
Electrochemical Characterization of Passive Films on Ni-Based Alloys in Acidic and Neutral Solutions
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DOI：
10.2320/matertrans.m2014384
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发表时间：
2015-04
影响因子：
1.2
通讯作者：
Wheejae Kim;H. Tsuchiya;S. Fujimoto
中科院分区：
文献类型：
--
作者：
Wheejae Kim;H. Tsuchiya;S. Fujimoto
本文报道了600和690合金在硼酸盐缓冲溶液和硫酸溶液中形成的钝化膜的结构、化学组成和电子性质。钝化膜的光电化学响应随合金基体和溶液的不同而不同。XPS分析表明，在硼酸盐缓冲溶液和硫酸溶液中，600和690合金表面形成的钝化膜由外层的氢氧化物层和内层的氧化物层组成。层的化学组成是相对不同的，这取决于解决方案，即，更多的铁被纳入到钝化膜中形成的硼酸盐缓冲溶液。[doi：10.2320/matertrans.M2014384]
The present work reports the structure, chemical composition and electronic properties of passive films formed on Alloy 600 and Alloy 690 in borate buffer and sulfuric acid solutions. Photoelectrochemical response from passive films varied depending on the alloy substrates and the solutions. XPS analysis revealed that the passive films formed on Alloy 600 and Alloy 690 consisted of an outer hydroxide layer and an inner oxide layer in the borate buffer solution as well as the sulfuric acid solution. The chemical composition of the layers was relatively different depending on the solutions, that is, more Fe was incorporated into the passive films formed in the borate buffer solution. [doi:10.2320/matertrans.M2014384]