Micro patterning of fused silica by laser ablation mediated by solid coating absorption
Micro patterning of fused silica by laser ablation mediated by solid coating absorption
复制标题
通过固体涂层吸收介导的激光烧蚀形成熔融石英的微图案
DOI：
10.1007/s00339-008-4663-3
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发表时间：
2008
期刊：
影响因子：
--
通讯作者：
J. Ihlemann
中科院分区：
文献类型：
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作者：
J. Ihlemann
通过激光烧蚀的精确图案化需要足够的吸收。对于弱吸收体，如熔融石英，已经开发了使用外部吸收体的间接方法。描述了一种使用固体SiO吸收剂涂层的新方法。ArF准分子激光器（波长193 nm）的照射导致涂层的烧蚀，并且在足够高的能量密度下导致熔融石英基底的烧蚀。未曝光区域中的剩余涂层随后通过大面积照射去除。使用28 nm厚的吸收层的衬底烧蚀的通量阈值为约1.1 J/cm 2。单脉冲烧蚀率高达800 nm，表面粗糙度Ra<5 nm。具有400 nm周期和80 nm调制深度的高分辨率光栅图案是可能的。该过程可以被描述为受控等离子体介导的消融。
Precise patterning by laser ablation requires sufficient absorption. For weak absorbers like fused silica indirect methods using external absorbers have been developed. A novel approach using a solid SiO absorber coating is described. Irradiation by an ArF excimer laser (wavelength 193 nm) is leading to ablation of the coating and, at sufficiently high fluence, of the fused silica substrate. The remaining coating in the unexposed areas is removed afterwards by large area irradiation. The fluence threshold for substrate ablation using a 28 nm thick absorber layer is about 1.1 J/cm2. Single pulse ablation rates of up to 800 nm and a surface roughness of Ra<5 nm are obtained. High resolution grating patterns with 400 nm period and a modulation depth of 80 nm are possible. The process can be described as controlled plasma mediated ablation.