Pulsed laser deposition of hard magnetic films

Pulsed laser deposition of hard magnetic films
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DOI：
10.1007/s00339-004-2839-z
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发表时间：
2004-09
期刊：
Applied Physics A
影响因子：
--
通讯作者：
S. Fähler;U. Hannemann;M. Weisheit;V. Neu;S. Melcher;S. Leinert;S. Wimbush;A. Singh;A. Kwon;B. Holzapfel;L. Schultz
S. Fähler;U. Hannemann;M. Weisheit;V. Neu;S. Melcher;S. Leinert;S. Wimbush;A. Singh;A. Kwon;B. Holzapfel;L. Schultz
中科院分区：
其他
文献类型：
--
作者：
S. Fähler;U. Hannemann;M. Weisheit;V. Neu;S. Melcher;S. Leinert;S. Wimbush;A. Singh;A. Kwon;B. Holzapfel;L. Schultz

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采用脉冲激光沉积技术制备了高织构的Nd-Fe-B和Fe-Pt硬磁薄膜，其磁电阻率分别为2 T和5.2 T。采用反射高能电子衍射和俄歇电子能谱等原位方法对薄膜生长过程中的成分和结构进行了分析。硬磁性能的优化与脉冲激光沉积的具体优势一起讨论。
Pulsed laser deposition from elemental targets was used to prepare highly textured hard magnetic Nd–Fe–B and Fe–Pt films with coercivities of 2 T and 5.2 T, respectively. In situ methods such as reflection high energy electron diffraction and Auger electron spectroscopy were applied to analyse film composition and structure during growth. Optimisation of the hard magnetic properties is discussed together with the specific advantages of pulsed laser deposition.