Photothermal ablation of polystyrene film by 248 nm excimer laser irradiation: A mechanistic study by time-resolved measurements
Photothermal ablation of polystyrene film by 248 nm excimer laser irradiation: A mechanistic study by time-resolved measurements
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DOI：
10.1155/1996/17451
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发表时间：
1996-01-01
期刊：
影响因子：
--
通讯作者：
Masuhara, H
中科院分区：
文献类型：
--
作者：
Tsuboi, Y;Sakashita, S;Masuhara, H
研究并讨论了248 nm激光烧蚀聚苯乙烯薄膜的机理。烧蚀阈值由蚀刻深度测量和纳秒照相观察确定。通过使用由激发脉冲的透射测量确认的有效吸收系数，阈值处的温度被评估为370 ℃。的温度是在良好的协议与聚合物的热降解，表明248 nm的聚苯乙烯烧蚀所带来的光热过程。烧蚀后的纳秒摄影可以从光热的观点得到很好的解释。此外，动力学的激发物种揭示纳秒时间分辨发光测量推断烧蚀。
Laser ablation mechanism at 248 nm irradiation of polystyrene film was investigated and discussed. An ablation threshold was determined by etch depth measurement and nanosecond photographic observation. Temperature at the threshold was evaluated to be 370 degrees C by using an effective absorption coefficient which was confirmed by transmission measurement of the excitation pulse. The temperature was in good agreement with that of thermal degradation of the polymer, showing that 248 nm ablation of polystyrene was brought about by a photothermal process. Nanosecond photography upon the ablation could be well interpreted from the photothermal viewpoint. Moreover, dynamics of excited species revealed by nanosecond time-resolved luminescence measurements was inferred in relation to the ablation.