Surface roughness of MgO thin film and its critical thickness for optimal biaxial texturing by ion-beam-assisted deposition
Surface roughness of MgO thin film and its critical thickness for optimal biaxial texturing by ion-beam-assisted deposition
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DOI：
10.1063/1.3565059
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发表时间：
2011-06
影响因子：
3.2
通讯作者：
S. Miyata;A. Ibi;T. Izumi;Y. Shiohara
中科院分区：
文献类型：
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作者：
S. Miyata;A. Ibi;T. Izumi;Y. Shiohara
我们研究了离子束辅助沉积 (IBAD) 制备的双轴织构 MgO 薄膜的面内晶粒排列 (Δφ) 和表面粗糙度 (w) 的沉积时间依赖性，并发现它们之间存在很强的相关性。 IBAD-MgO 表面粗糙度的时间演变显示出突然增加，同时对应于 Δφ 开始恶化。尽管每种条件下的沉积速率显着不同，但在不同沉积条件下使用不同辅助离子束电流获得的粗糙度与厚度分布图却塌陷为单一曲线。这意味着无论沉积速率如何，粗糙度的突然增加都会发生在相同的厚度（约 4 nm）处。结果还表明，Δφ劣化从约4nm的相同厚度开始。这个约4nm的“临界”厚度可能与薄膜结晶的完成有关。此外，沉积超出了临界点...
We investigated the deposition time dependences of the in-plane grain alignment (Δφ) and the surface roughness (w) of biaxially textured MgO thin films fabricated by ion-beam-assisted deposition (IBAD) and found a strong correlation between them. The time evolution of the surface roughness of IBAD-MgO showed an abrupt increase at the same time corresponding to the beginning of the deterioration in Δφ. The roughness versus thickness profiles obtained under different deposition conditions with different assisting ion-beam currents collapsed to a single curve, even though the deposition rates were significantly different in each condition. This implies that the abrupt increase in roughness occurred at the same thickness—of about 4 nm—irrespective of the deposition rate. The result also indicated that the Δφ deterioration began with the same thickness of about 4 nm. This “critical” thickness of about 4 nm might be related to the completion of the crystallization of the film. Further, deposition beyond the cri...