Uncertainty Analysis Method Including Influence of Probe Alignment on On-Wafer Calibration Process
Uncertainty Analysis Method Including Influence of Probe Alignment on On-Wafer Calibration Process
复制标题
不确定性分析方法,包括探针对准对晶圆校准过程的影响
DOI:
10.1109/tim.2019.2907733
复制
发表时间:
2019
影响因子:
5.6
通讯作者:
M. Horibe
中科院分区:
文献类型:
--
作者:
R. Sakamaki;M. Horibe
This paper describes an uncertainty analysis method, including a detailed analysis of the contributions of probe alignment in the <inline-formula> <tex-math notation="LaTeX">$X$ </tex-math></inline-formula>-, <inline-formula> <tex-math notation="LaTeX">$Y$ </tex-math></inline-formula>-, and <inline-formula> <tex-math notation="LaTeX">$Z$ </tex-math></inline-formula>-coordinates, tilt angle, and rotation angle. The contribution of each contributor was analyzed through the Monte Carlo calculation with a multiline thru–reflect–line (mTRL) calibration algorithm. The contribution of each probe position was separated using a precision probing technique with a fully automatic probe station. Thru and line standards were found to have a larger impact on calibration reproducibility than the reflect standard. Furthermore, the distance between probes was found to be the most dominant uncertainty contributor. These results can be explained by the conventional vector analyzer system theories. Finally, uncertainties were estimated with the conventional manual probing and precision probing technique by the developed analysis algorithm. The analysis result shows that the precision probing technique significantly decreased uncertainty by reducing variations in probe positions, which provides the corroborative evidence of the improvement of measurement reproducibility by the precision probing technique.