The pack-boronizing of pure vanadium under a controlled atmosphere
The pack-boronizing of pure vanadium under a controlled atmosphere
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DOI：
10.1016/j.apsusc.2010.06.013
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发表时间：
2010-10-01
影响因子：
6.7
通讯作者：
Calik, Adnan
中科院分区：
文献类型：
--
作者：
Tarakci, Mehmet;Gencer, Yucel;Calik, Adnan
纯钒在可控气氛下于1100 ℃进行4、8、12和16 h的固体渗硼。采用金相、表面轮廓仪、扫描电镜-能谱仪、X射线衍射仪和显微硬度计对纯钒表面形成的硼化物进行了表征。金相分析结果表明，纯钒表面形成了一层致密、致密、表面相对光滑的硼化物层。硼化物层与母材之间的界面呈波浪状。通过表面和横截面XRD分析证实了纯钒上仅形成VB 2相。在所有的渗硼次数下，渗硼层的显微硬度约为3700 HV。硼化物层的断裂韧性进行了评估，使用维氏压痕，给出的值为2.1-5.9和1.7-3.4 MPa m（1/2）的Palmqvist和中位数/径向的方法，分别。硼化物层的厚度随渗硼时间从23 μ m增加到50 μ m，几乎呈抛物线形增加。涂层的表面粗糙度由约0.58 μ m增加到2.25 μ m。(C)2010 Elsevier BV保留所有权利。
Pack boronizing of pure vanadium was performed at 1100 degrees C for 4, 8, 12 and 16 h under a controlled atmosphere. Characterization of the boride formed on the surface of pure vanadium was carried out by metallographic techniques, profilometry, SEM-EDS, XRD and microhardness measurements. The metallographic studies revealed that a single boride layer with dense, compact and relatively smooth morphology was formed on the surface of pure vanadium. The interface between boride layer and base metal was wavy in nature. The formation of only the VB2 phase on pure vanadium was confirmed by surface and cross-sectional XRD analysis. The microhardness of the boride layer was approximately 3700HV for all boriding times. Fracture toughness of the boride layer was evaluated using Vickers indentation, giving the value of 2.1-5.9 and 1.7-3.4 MPa m(1/2) for Palmqvist and median/radial approaches, respectively. Thickness of the boride layer increased almost parabolically from about 23 to 50 mu m with boriding time. Surface roughness of the coating was relatively increased from approximately 0.58 to 2.25 mu m by boriding duration. (C) 2010 Elsevier B.V. All rights reserved.