Nonequilibrium Atmospheric Plasma Deposition
Nonequilibrium Atmospheric Plasma Deposition
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DOI：
10.1007/s11666-011-9642-0
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发表时间：
2011-06-01
影响因子：
3.1
通讯作者：
Gries, T.
中科院分区：
文献类型：
--
作者：
Belmonte, T.;Henrion, G.;Gries, T.
本文对常压等离子体增强化学气相沉积（PECVD）技术进行了综述。介绍了大面积涂料的来源。毫米火炬和微等离子体是下一步研究局部PECVD。特别注意功率的耗散方式及其对沉积速率和薄膜质量的影响。
This study is a review of plasma enhanced chemical vapor deposition (PECVD) at atmospheric pressure. Sources for coatings over large area are presented. Millimetric torches and microplasmas are next studied for localized PECVD. A specific attention is paid to the way power is dissipated and the consequences it has on the deposition rate and on quality of thin films.