The Quantitative Role of Surface Doped Fluorine for the Improvement of Oxidation Resistance of TiAl in Air
The Quantitative Role of Surface Doped Fluorine for the Improvement of Oxidation Resistance of TiAl in Air
复制标题
表面掺杂氟对提高TiAl在空气中抗氧化性能的定量作用
DOI：
10.4028/www.scientific.net/msf.461-464.505
复制
发表时间：
2004
期刊：
影响因子：
--
通讯作者：
K. Bethge
中科院分区：
文献类型：
--
作者：
H. Zschau;M. Schütze;H. Baumann;K. Bethge
TiAl在高温（> 750°C）下的抗氧化性可以通过添加少量的氟来改善。通过离子注入或通过用稀释的HF润湿来施加氟。研究了在1h/空气下加热至1000°C期间氟的行为。采用非破坏性离子束分析（PIGE）的氟深度浓度分布在近表面区域进行了测定之前和之后的氧化。两种类型的氟应用显示出类似的结果。氟深度分布的温度依赖性显示在氧化1小时后在400° C和500°C之间氟的明显损失。与此相反，氟的量在500°C以上至1000°C缓慢下降。高的氟损失是由于TiF 4的形成。剩余的氟含量为氟微合金化效应的技术应用提供了可能性，以提高TiAl合金在750°C以上的抗氧化性。
The oxidation resistance of TiAl at elevated temperatures (> 750°C) can be improved by the addition of small amounts of fluorine. The fluorine was applied either by ion implantation or by wetting with diluted HF. The behaviour of fluorine was studied during heating up 1000°C at 1h/air. Using non-destructive Ion Beam Analysis (PIGE) the fluorine depth concentration profiles in the near surface region were determined before and after oxidation. Both types of fluorine application show similar results. The temperature dependence of the fluorine depth profiles shows a distinct loss of fluorine between 400° and 500°C after oxidation for 1 hour. In contrast to this the fluorine amount decreases slowly above 500°C up to 1000°C. The high fluorine loss is due to the formation of TiF4. The remaining fluorine content offers the possibility for a technical application of the fluorine microalloying effect to improve the oxidation resistance of TiAl-alloys above 750°C.