Verification of topological magnetic properties of patterned ferromagnetic films
Verification of topological magnetic properties of patterned ferromagnetic films
复制标题
图案化铁磁薄膜的拓扑磁性能验证
DOI:
10.1063/5.0016672
复制
发表时间:
2020
影响因子:
4
通讯作者:
Longjiang Deng
中科院分区:
文献类型:
--
作者:
Mei Bi;Jian Xue;Le Yuan;Xin Wang;Xiaolong Weng;Longjiang Deng
Topological order of magnetic films shows promise due to its unconventional electromagnetic transport effects, but the discontinuity and the miniaturization of patterned magnetic films impose a limit on research of topological properties. In this article, a technique is proposed, the application of which improves the ease of electrical measurement in sub-micrometer-sized magnetic thin film elements. To obtain the topological Hall resistivity of the discretized magnetic textures, a ferromagnetic bilayer film was fabricated into specific geometries. Micromagnetic simulations are presented that demonstrate the topological spin distribution in an exchange coupled patterned ferromagnetic film. Experiments are performed on FePt/FeNi bilayered films that are formed with square arrays of FeNi disks on top of a continuous FePt film in a topological spin distribution. The observation of topological Hall effect was made in the FePt/FeNi film without a nanoscale Hall-bar device. The technique presented facilitates the electrical property measurement even in nanometer elements and offers a pathway for promoting spintronics applications.