Ruthenium Electrodeposition from Water-in-Salt Electrolytes and the Influence of Tetrabutylammonium

Ruthenium Electrodeposition from Water-in-Salt Electrolytes and the Influence of Tetrabutylammonium
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DOI:
10.1149/1945-7111/ab847e
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发表时间:
2020-04
影响因子:
3.9
通讯作者:
W. Sides;Qiang Huang
W. Sides;Qiang Huang
中科院分区:
工程技术4区
文献类型:
--
作者:
W. Sides;Qiang Huang

文献摘要

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评价了盐包水电解液用于金属钌的电沉积。评价了浓氯化锂和稀四丁基铵对质子还原的抑制机理。发现浓缩的LiCl破坏溶液本体内的氢键网络,而发现TBA吸附到电极表面上,阻止质子进入。钌在盐包水电解质和稀水性电解质中以不同的络合物存在,导致沉积起始电位发生− 300 mV的偏移。当通过使用盐包水电解质在质子过电位下沉积时,可以获得Ru沉积的更大电流效率,并且TBA可以提供进一步的改进。研究了Ru薄膜的晶粒结构和电阻率。
The use of water-in-salt electrolytes is evaluated for the electrodeposition of metallic ruthenium. The mechanisms of proton reduction inhibition by concentrated LiCl and dilute tetrabutylammonium is evaluated. Concentrated LiCl is found to disrupt the hydrogen bonding network within the solution bulk, whereas TBA is found to adsorb onto the electrode surface, blocking proton access. Ruthenium exists as a different complexed species in water-in-salt electrolytes vs dilute aqueous electrolytes, leading to a− 300 mV shift in the deposition onset potential. Greater current efficiencies of Ru deposition can be obtained when depositing at proton overpotentials by the use of water-in-salt electrolytes, and TBA can offer further improvements. The grain structure and resistivities of Ru thin films are studied.