Process Technology Variation
Process Technology Variation
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DOI：
10.1109/ted.2011.2121913
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发表时间：
2011-08-01
影响因子：
3.1
通讯作者：
Mudanai, Sivakumar
中科院分区：
文献类型：
--
作者：
Kuhn, Kelin J.;Giles, Martin D.;Mudanai, Sivakumar
摩尔定律的技术扩展在过去40年中将性能提高了五个数量级。随着先进技术继续追求摩尔定律，将需要克服各种挑战。这些挑战之一是过程变化的管理。本文讨论了工艺变化在现代晶体管技术中的重要性，回顾了前端变化的来源，介绍了器件和电路变化的测量技术，包括来自32 nm节点的电路和存储器数据，并比较了最近文献中的晶体管本征变化性能。
Moore's law technology scaling has improved performance by five orders of magnitude in the last four decades. As advanced technologies continue the pursuit of Moore's law, a variety of challenges will need to be overcome. One of these challenges is the management of process variation. This paper discusses the importance of process variation in modern transistor technology, reviews front-end variation sources, presents device and circuit variation measurement techniques, including circuit and memory data from the 32-nm node, and compares recent intrinsic transistor variation performance from the literature.