The influence of inorganic oxidants and metal ions on semiconductor sensitized photodegradation of 4-fluorophenol
The influence of inorganic oxidants and metal ions on semiconductor sensitized photodegradation of 4-fluorophenol
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DOI：
10.1016/j.cej.2006.07.016
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发表时间：
2007-03-15
影响因子：
15.1
通讯作者：
Swaminathan, M.
中科院分区：
文献类型：
--
作者：
Selvam, K.;Muruganandham, M.;Swaminathan, M.
本文主要研究了无机氧化剂和金属离子对二氧化钛、氧化锌敏化紫外光催化降解4-氟苯酚的影响。二氧化钛-P25的催化效率比氧化锌更高。在氧化剂中，高碘酸根离子通过生成反应性自由基更有效地促进了4-FP的降解。氧化剂对4-FP降解的影响顺序为：IO4->；BrO_3->；S_2O_82-H_2O_2>；ClO_3-。金属离子对4-FP降解的影响顺序为：Mg~(2+)和GT；Fe~(3+)和GT；Fe~(2+)和GT；4-FP的降解符合Langmuir-HinShelwood模型的准一级动力学。光矿化作用也得到了化学需氧量、气相色谱和氟离子测量的证实。(C)2006爱思唯尔B.V.保留所有权利。
This paper mainly focuses on the influence of inorganic oxidants and metal ions on the TiO2, ZnO sensitized photodegradation of 4-fluorophenol (4-FP) by UV-A light. TiO2-P25 is more efficient than ZnO. Among the oxidants periodate ion was found to be more efficient than others in improving the degradation of 4-FP via formation of reactive radicals. The effect of oxidants on the degradation of 4-FP was found to be in the order of IO4- > BrO3- > S2O82- H2O2 > ClO3-. The effect of metal ions on degradation of 4-FP was found to be in the order of Mg2+ > Fe3+ > Fe2+ > Cu2+. The degradation of 4-FP follows pseudo-first order kinetics according to the Langmuir-Hinshelwood model. The photomineralisation has also been confirmed by COD, gas chromatography and fluoride ion measurements. (c) 2006 Elsevier B.V. All rights reserved.