Micro-PIXE and micro-RBS characterization of micropores in porous silicon prepared using microwave-assisted hydrofluoric acid etching.
Micro-PIXE and micro-RBS characterization of micropores in porous silicon prepared using microwave-assisted hydrofluoric acid etching.
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使用微波辅助氢氟酸蚀刻制备的多孔硅中微孔的 Micro-PIXE 和 micro-RBS 表征。
DOI：
10.1017/s1431927612014262
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发表时间：
2013
期刊：
影响因子：
--
通讯作者：
Ahmad M
中科院分区：
文献类型：
--
作者：
Ahmad M
采用微波辅助氢氟酸（HF）腐蚀方法从预注入5 MeV Cu离子的硅片上制备多孔硅（PS）。微束质子诱导X射线发射（微PIXE）和微束卢瑟福背散射技术的使用首次揭示了这些技术用于研究微孔形成的能力。从微PIXE成像结果观察到的多孔结构进行了比较，扫描电子显微镜图像。据观察，注入的铜积累在相同的位置作为孔，并在高注入剂量的孔形成大规模的图案的线和同心圆。这是第一个工作证明了微波辅助HF蚀刻在PS的形成中的使用。
Porous silicon (PS) has been prepared using a microwave-assisted hydrofluoric acid (HF) etching method from a silicon wafer pre-implanted with 5 MeV Cu ions. The use of microbeam proton-induced X-ray emission (micro-PIXE) and microbeam Rutherford backscattering techniques reveals for the first time the capability of these techniques for studying the formation of micropores. The porous structures observed from micro-PIXE imaging results are compared to scanning electron microscope images. It was observed that the implanted copper accumulates in the same location as the pores and that at high implanted dose the pores form large-scale patterns of lines and concentric circles. This is the first work demonstrating the use of microwave-assisted HF etching in the formation of PS.