Statistical analysis of geometrical imperfections from the images of 2D photonic crystals.
Statistical analysis of geometrical imperfections from the images of 2D photonic crystals.
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DOI：
10.1364/opex.13.002487
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发表时间：
2005-04
期刊：
影响因子：
3.8
通讯作者：
M. Skorobogatiy;G. Bégin;A. Talneau
中科院分区：
文献类型：
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作者：
M. Skorobogatiy;G. Bégin;A. Talneau
分析了用电子束光刻技术在不同材料上制作的平面光子晶体（PC）光学元件的高分辨率图像，以表征常见二维几何缺陷的统计特性。我们的动机是试图一个直观的，而严格的统计描述的制造缺陷，提供一个现实的输入到PC设备性能的理论建模。
High resolution images of planar photonic crystal (PC) optical components fabricated by e-beam lithography in various materials are analyzed to characterize statistical properties of common 2D geometrical imperfections. Our motivation is to attempt an intuitive, while rigorous statistical description of fabrication imperfections to provide a realistic input into theoretical modelling of PC device performance.