Energy resolved ion mass spectroscopy of the plasma during reactive magnetron sputtering
Energy resolved ion mass spectroscopy of the plasma during reactive magnetron sputtering
复制标题
反应磁控溅射过程中等离子体的能量分辨离子质谱
DOI：
10.1016/s0257-8972(01)01071-4
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发表时间：
2001
影响因子：
5.4
通讯作者：
P. Panjan
中科院分区：
文献类型：
--
作者：
M. Mišina;L. Shaginyan;M. Macek;P. Panjan
利用能量分辨质谱技术研究了TiN和TiWN薄膜反应磁控溅射过程中衬底上离子通量的能量分布和组成。Hiden EQP500探针的入口法兰与Ti或WTi （70:30 at）保持50 mm的距离。%)目标直径100毫米。溅射在不同成分的氩气和氮气的混合物中进行，压力为0.05 ~ 10pa，放电电流为0.5 ~ 7a。离子在低压下的能谱以延伸的高能尾巴为特征。溅射（金属）原子的高能量来源于它们溅射后在阴极上的分布。高能气体离子（Ar+, N2+, N+）有两个来源。一是与溅射金属原子碰撞时的能量转移。另一种是来自重元素的高能离子在靶中的反射。当压力从0.5 Pa增加到10 Pa时，衬底处离子能量明显降低。由于在许多碰撞中能量的损失，离子能谱的高能部分减少，各种离子的能谱变得相似。尽管如此，反射的离子仍然很明显，尽管强度较低。TRIM蒙特卡罗模拟结果表明，快速反射离子的通量与溅射原子的通量具有相同的数量级，从而表明前者在低压下形成薄膜性能的重要作用。对氮氩混合溅射过程中离子通量组成的分析表明，TiN+/Ti+的离子通量比达到最大值约为0.13，而WN+/W+的离子通量比达到0.3。
The energy distribution and composition of the ion flux on a substrate during reactive magnetron sputtering of TiN and TiWN films were studied by the energy resolved mass spectroscopy. The entrance flange of the probe Hiden EQP500 was positioned in a distance of 50 mm from the Ti or WTi (70:30 at.%) target 100 mm in diameter. The sputtering was carried out in a mixture of argon and nitrogen of various compositions at pressures from 0.05 to 10 Pa and discharge currents from 0.5 to 7 A. The energy spectra of ions at low pressures were characterized by extended high-energy tails. The high energy of sputtered (metal) atoms follows from their distribution at the cathode after being sputtered. The high-energy gas ions (Ar+, N2+, N+) stem from two sources. One is the transfer of energy in the collisions with the sputtered metal atoms. The other is the reflection of the energetic ions from heavy elements in the target. A strong reduction of the ion energy at the substrate was found when the pressure was increased from 0.5 to 10 Pa. As a consequence of a loss of energy in many collisions the high-energy portion of the ion energy spectra diminished and the energy spectra of various kinds of ions became similar. Nevertheless, the reflected ions were still apparent, albeit at lower intensity. The TRIM Monte-Carlo simulation showed that the flux of the fast reflected ions and flux of sputtered atoms are of the same order of magnitude, indicating thus the important role of the former species in forming the film properties at low pressures. The analysis of the composition of the ion flux during sputtering in a mixture of nitrogen and argon revealed that the ratio of ion fluxes TiN+/Ti+reached maximum of approximately 0.13, while WN+/W+was up to 0.3.