Development of W coatings for fusion applications
Development of W coatings for fusion applications
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DOI：
10.1016/j.fusengdes.2011.04.031
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发表时间：
2011-10
影响因子：
1.7
通讯作者：
C. Ruset;E. Grigore;H. Maier;R. Neu;H. Greuner;M. Mayer;G. Matthews
中科院分区：
文献类型：
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作者：
C. Ruset;E. Grigore;H. Maier;R. Neu;H. Greuner;M. Mayer;G. Matthews
本文简要介绍了在碳材料（碳纤维复合材料- CFC和细粒石墨- FGG）上采用各种方法沉积钨涂层的研究进展。对真空等离子体喷涂（VPS）、化学气相沉积（CVD）和物理气相沉积（PVD）技术进行了分析，分析了W涂层的特点和性能。特别关注的是联合磁控溅射和离子注入（CMSII）技术，该技术在过去4年中从实验室发展到工业规模，并成功应用于JET和ASDEX升级公司ITER-like Wall项目的2500多块W涂层（10-15μm和20-25μm）。该技术同时涉及磁控溅射和高能离子注入（数十keV）。由于离子轰击，涂层内发生应力释放，使其在没有分层的情况下生长到相对较大的厚度。此外，为了调节CFC与W之间的热膨胀失配，目前采用了2-3μm的Mo夹层。实验中，制备了厚度达50μm的W/Mo涂层，并成功地在GLADIS离子束设备中进行了测试，测试速度为23MW/m2。
The paper gives a short overview on tungsten (W) coatings deposited by various methods on carbon materials (carbon fibre composite – CFC and fine grain graphite – FGG). Vacuum Plasma Spray (VPS), Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) techniques are analyzed in respect with the characteristics and performances of the W coatings. A particular attention is paid to the Combined Magnetron Sputtering and Ion Implantation (CMSII) technique, which was developed during the last 4 years from laboratory to industrial scale and it is successfully applied for W coating (10–15μm and 20–25μm) of more than 2500 tiles for the ITER-like Wall project at JET and ASDEX Upgrade. This technique involves simultaneously magnetron sputtering and high energy (tens of keV) ion implantation. Due to the ion bombardment a stress relief occurs within the coating enabling its growth without delamination to a relatively large thickness. In addition, in order to adjust the thermal expansion mismatch between CFC and W, a Mo interlayer of 2–3μm is currently used. Experimentally, W/Mo coatings with a thickness up to 50μm were produced and successfully tested in the GLADIS ion beam facility up to 23MW/m2.