Optical materials and coatings at 157 nm
Optical materials and coatings at 157 nm
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157 nm 光学材料和涂层
DOI：
10.1117/12.351106
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发表时间：
1999
期刊：
影响因子：
--
通讯作者：
R. B. Goodman
中科院分区：
文献类型：
--
作者：
T. Bloomstein;V. Liberman;M. Rothschild;D. Hardy;R. B. Goodman
我们更新了以前报道的用于157 nm光学投影系统的光学材料和涂层的吸收结果。新的结果包括用于掩模基板的具有合适的初始透射率的改性形式的熔融二氧化硅的透射谱。我们还报告了更系统地研究表面污染物对157 nm光学元件的影响。我们对真空光谱仪进行了改进，允许现场清洗，以便更仔细地检查清洗要求和清洗程序。
We update previously reported results on the absorption of optical materials and coatings for use in 157 nm based optical projection system. New results include the transmissions spectrum of a modified from of fused silica with suitable initial transmission for use as a mask substrate. We also report on a more systematic study of the effects of surface contaminants on optical components at 157 nm. We have modified our vacuum spectrometer to allow in- situ cleaning to enable a closer examination of purging requirements and cleaning procedures.