Design and fabrication of antireflective nanoparticulate thin films with superhydrophilic self-cleaning properties on glass substrate

Design and fabrication of antireflective nanoparticulate thin films with superhydrophilic self-cleaning properties on glass substrate
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DOI:
10.1016/j.jtice.2011.03.002
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发表时间:
2011-09-01
影响因子:
5.7
通讯作者:
Yang, Yu-Min
Yang, Yu-Min
中科院分区:
工程技术3区
文献类型:
--
作者:
Lin, Shu-Hsuan;Wu, Yi-Ni;Yang, Yu-Min

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设计并制备了7 nm二氧化钛/22 nm二氧化硅全纳米粒子涂层,通过水基静电逐层组装工艺在玻璃衬底上制备了透明、超亲水的自清洁薄膜。X=120的(TiO2/SiO_2)(X)多层膜具有稳定的共形结构,表现出减反射、超亲水和自清洁等多功能性能。这是通过使用适当的周期性焙烧而不是只对组装的纳米颗粒薄膜进行一次焙烧来实现的。测得纳米颗粒薄膜在633 nm处的平均折射率为1.30+/-0.03,平均双层厚度为20.18 nm。此外,所有纳米颗粒薄膜的平均透过率都在93.5%以上,实验结果最多只比理论预测值低2%。通过两种模型污染物在紫外光照射下的分解,揭示了纳米颗粒薄膜的自清洁特性。实验结果表明,纳米颗粒薄膜的光催化分解速率随双层数的增加而增加。(C)2011年台湾化学工程师学会。爱思唯尔出版,版权所有。
Design and fabrication of transparent and superhydrophilic self-cleaning thin films on glass substrate by 7 nm TiO2/22 nm SiO2 all-nanoparticle coatings via aqueous electrostatic layer-by-layer assembly processing were demonstrated in this work. Stable and conformal structure of multibilayer (TiO2/SiO2)(x) with x up to 120 was shown to exhibit antireflective, superhydrophilic, and self-cleaning multifunctional properties. This was achieved by using appropriate periodic calcinations rather than only once calcination of the assembled nanoparticulate thin films. Average refractive index of 1.30 +/- 0.03 at 633 nm and average bilayer thickness of 20.18 nm were determined for the as-fabricated nanoparticulate thin films. Furthermore, average transmittance values higher than 93.5% were exhibited by all the nanoparticulate thin films and the experimental results were only at the very most of 2% lower than those predicted by the theory. The self-cleaning properties of the nanoparticulate thin films were revealed by the decomposition of two model contaminants under UV illumination. The experimental results showed that the photocatalytic decomposition rates are increased with the increase of bilayer number of the nanoparticulate thin film. (C) 2011 Taiwan Institute of Chemical Engineers. Published by Elsevier B.V. All rights reserved.