High quality textured ZnO:Al surfaces obtained by a two-step wet-chemical etching method for applications in thin film silicon solar cells
High quality textured ZnO:Al surfaces obtained by a two-step wet-chemical etching method for applications in thin film silicon solar cells
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DOI：
10.1016/j.solmat.2011.03.042
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发表时间：
2011-08-01
影响因子：
6.9
通讯作者：
Gandia, J. J.
中科院分区：
文献类型：
--
作者：
Fernandez, S.;de Abril, O.;Gandia, J. J.
研究了通过射频磁控溅射在 250 摄氏度下在康宁玻璃上沉积的 ZnO:Al 薄膜作为薄膜硅太阳能电池前接触的用途。为此，开发了一种结合不同浓度稀盐酸（0.1%至3%）和不同蚀刻时间的两步蚀刻方法。评估了其对蚀刻膜的形态、电学和光学性能的影响。这种新的蚀刻方法产生了更均匀的纹理表面，其中电性能在蚀刻过程后保持不变，并且具有与商业基板相似的适应性光散射特性。 (C) 2011 Elsevier B.V. 保留所有权利。
ZnO:Al films deposited at 250 degrees C on Corning glass by radio frequency magnetron sputtering were studied for their use as front contact for thin film silicon solar cells. For this purpose, a two-step etching method combining different concentrations of diluted hydrochloric acid (from 0.1% to 3%) with different etching times was developed. Its influence on morphological, electrical and optical properties of the etched films was evaluated. This new etching method led to more uniform textured surfaces, where the electrical properties remained unchangeable after the etching process, and with adapted light scattering properties similar to those exhibited by commercial substrates. (C) 2011 Elsevier B.V. All rights reserved.