A Rotating Ring Disk Study of Accelerators with Cl<sup>-</sup> and Br<sup>-</sup> for Copper Damascene Electrodeposition

A Rotating Ring Disk Study of Accelerators with Cl<sup>-</sup> and Br<sup>-</sup> for Copper Damascene Electrodeposition
复制标题

铜镶嵌电沉积Cl<sup>-</sup>和Br<sup>-</sup>加速器旋转环盘研究

DOI:
10.4139/sfj.69.352
复制
发表时间:
2018
期刊:
Journal of The Surface Finishing Society of Japan
影响因子:
--
通讯作者:
Ha Van Hoang,Tetsuji Hirato and Kazuo Kondo
Ha Van Hoang,Tetsuji Hirato and Kazuo Kondo
中科院分区:
--
文献类型:
--
作者:
Anh Van Nhat Tran;Ha Van Hoang,Tetsuji Hirato and Kazuo Kondo

文献摘要

相似文献