Hosoda Naoe, Kyogoku Yoshitaka, Suga Tadatomo: "Effect of the surface activation by fast atom and radical irradiation on Al-Si and Al-SiO2 bonding" Proc.1st Sym. "Microjoining and Assembly Technology in Electronics". 79-82 (1995)
Hosoda Naoe, Kyogoku Yoshitaka, Suga Tadatomo: "Effect of the surface activation by fast atom and radical irradiation on Al-Si and Al-SiO2 bonding" Proc.1st Sym. "Microjoining and Assembly Technology in Electronics". 79-82 (1995)
复制标题
Hosoda Naoe、Kyogoku Yoshitaka、Suga Tadatomo：“快速原子和自由基照射的表面活化对 Al-Si 和 Al-SiO2 键合的影响”Proc.1st Sym。
DOI：
--
复制
发表时间：
--
期刊：
影响因子：
--
通讯作者：
中科院分区：
文献类型：
--
作者：
